The choice between single-ended and balanced r.f. sputtering systems
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/1/i=5/a=418/pdf
Reference7 articles.
1. Sputtering of Dielectrics by High‐Frequency Fields
2. Plasma Sheath Formation by Radio-Frequency Fields
3. Dielectric Thin Films through rf Sputtering
4. A radio frequency dielectric sputtering system with non-grounded electrodes
5. A small scale ratio frequency sputtering apparatus
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1. Glow Discharge Sputter Deposition;Thin Film Processes;1978
2. Some characteristics and uses of low‐pressure plasmas in materials science;Journal of Vacuum Science and Technology;1977-01
3. Thin polymer films;Thin Solid Films;1973-11
4. Control of Film Properties by rf-Sputtering Techniques;Journal of Vacuum Science and Technology;1971-09
5. A review of some recent vacuum studies (related to pumps and ion beam sputtering systems);Vacuum;1970-05
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