Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2

Published:2009-02-16 Issue:5 Volume:42 Page:055206
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Stafford Luc,Khare Rohit,Guha Joydeep,Donnelly Vincent M,Poirier Jean-Sébastien,Margot Joëlle

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/42/i=5/a=055206/pdf

Reference41 articles.

1. Kinetic study of low energy argon ion-enhanced plasma etching of polysilicon with atomic/molecular chlorine

2. Kinetic study of low energy ion-enhanced polysilicon etching using Cl, Cl2, and Cl+ beam scattering

3. Plasma beam studies of Si and Al etching mechanisms

4. Reaction of atomic and molecular chlorine with aluminum

5. Etching of polysilicon in inductively coupled Cl[sub 2] and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hybrid simulation of radio frequency biased inductively coupled Ar/O<sub>2</sub>/Cl<sub>2</sub> plasmas;Acta Physica Sinica;2024

2. Investigation of the dual-frequency bias effect on inductively coupled Cl₂ plasmas by hybrid simulation;Journal of Physics D: Applied Physics;2023-06-08

3. Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes;Journal of Physics D: Applied Physics;2022-11-08

4. On the chemistry mechanism for low-pressure chlorine process plasmas;Journal of Vacuum Science & Technology B;2022-09

5. Electron power absorption in radio frequency driven capacitively coupled chlorine discharge;Plasma Sources Science and Technology;2021-06-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3