Time- and space-resolved spectroscopy of electron transport in low-frequency discharge plasma in argon
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/20/i=10/a=006/pdf
Reference25 articles.
1. Radiative Lifetime Measurements of Excited Levels in Neon i and Argon ii
2. Transition probabilities for lines arising from levels belonging to the 3p5np (n = 4, 5, 6) configurations of Ar I
3. Evidence for a time dependent excitation process in silane radio frequency glow discharges
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