Local study of thickness-dependent electronic properties of ultrathin silicon oxide near SiO2/Si interface
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/40/i=9/a=033/pdf
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1. High-κ gate dielectrics: Current status and materials properties considerations
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