Spectral characterization of medium-pressure RF discharge in argon–oxygen mixture
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/47/i=33/a=335206/pdf
Reference32 articles.
1. Study of the surface mechanisms in an Ar–N2 post-discharge cleaning process
2. Low temperature atmospheric pressure plasma sources for microbial decontamination
3. Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3;Processes;2024-03-20
2. Unraveling Exclusive In-Plasma Initiated Oxidation Processes Occurring at Polymeric Surfaces upon O2 Admixtures to Medium Pressure Ar and N2 DBD Treatments;Polymers;2023-07-08
3. The production of reactive chlorine species (RCS) by argon and helium plasma jets and the sensitivity of liver cancer cell HepG2 to RCS and H2O2 treatment;Plasma Processes and Polymers;2023-07-08
4. Effective ionization coefficient in mixtures of Ar and O2 determined using the Townsend discharge;AIP Advances;2022-10-01
5. The Production of Plasma Activated Water in Controlled Ambient Gases and its Impact on Cancer Cell Viability;Plasma Chemistry and Plasma Processing;2021-05-27
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3