The NO(A) excitation mechanism in a - pulsed RF discharge
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/30/i=20/a=016/pdf
Reference23 articles.
1. Production of N, O and NO in N2-O2flowing discharges
2. Experimental and theoretical investigation of a N2-O2DC flowing glow discharge
3. Non-equilibrium coupled kinetics in stationary N2-O2discharges
4. Kinetic model of a low-pressure N/sub 2/-O/sub 2/ flowing glow discharge
5. Surface kinetics of N and O atoms in discharges
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