Characteristics of (Ti,Ta)N thin films prepared by using pulsed high energy density plasma-Reference-Cited by-同舟云学术

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Characteristics of (Ti,Ta)N thin films prepared by using pulsed high energy density plasma

Published:2007-06-29 Issue:14 Volume:40 Page:4228-4233
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Feng Wenran,Chen Guangliang,Li Li,Lv Guohua,Zhang Xianhui,Niu Erwu,Liu Chizi,Yang Si-ze

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/40/i=14/a=018/pdf

Reference26 articles.

1. Turning tests of high rate reactively sputter-coated T-15 HSS inserts

2. How TiN coatings improve the performance of high speed steel cutting tools

3. The effect of ion beam bombardment on the properties of Ta(C)N films deposited from pentakis-diethylamido-tantalum

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2. Optical and Photocatalytic Properties of Three-Dimensionally Ordered Macroporous Ta₂O₅ and Ta₃N₅ Inverse Opals;Chemistry of Materials;2023-09-21

3. Dense Plasma Focus—High-Energy-Density Pulsed Plasma Device Based Novel Facility for Controlled Material Processing and Synthesis;Plasma Science and Technology for Emerging Economies;2017

4. Pristine Ta3N5Nanotubes: Trap-Driven High External Biasing Perspective in Semiconductor/Electrolyte Interfaces;Chemistry - A European Journal;2016-11-10

5. Mechanical and Tribological Properties of TiTaBN Graded-Composite Coatings Deposited Using the CFUBMS Technique;Tribology Transactions;2016-07-07

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