Rate constants for the reactions of SiH and SiH2with SiH4in a low-pressure SiH4plasma
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/28/i=9/a=027/pdf
Reference23 articles.
1. Measurement of Si atom density in radio‐frequency silane plasma using ultraviolet absorption spectroscopy
2. Measurement of Absolute Densities and Spatial Distributions of Si and SiH in an RF-Discharge Silane Plasma for the Chemical Vapor Deposition of a-Si:H Films
3. Measurement of SiH2Densities in an RF-Discharge Silane Plasmae Used in the Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Film
4. Laser-Induced-Fluorescence Detection of SiH2Radicals in a Radio-Frequency Silane Plasma
Cited by 30 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A plasma chemistry model for H2/SiH4 mixtures used in PECVD processes;Physica Scripta;2023-04-21
2. Combined Experimental and Computational Study on the Reaction Dynamics of the D1-Silylidyne(SiD) – Silane (SiH4) System;The Journal of Physical Chemistry A;2021-03-18
3. Modelling the non-local thermodynamic equilibrium spectra of silylene (SiH2);Physical Chemistry Chemical Physics;2021
4. Plasma monitoring and PECVD process control in thin film silicon-based solar cell manufacturing;EPJ Photovoltaics;2014
5. A generic approach to the preparation of Si-based nanodome arrays;Journal of Physics D: Applied Physics;2008-08-19
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3