Effect of overlayer thickness on electron emission from Si:Cs-O NEA surfaces
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/9/i=14/a=023/pdf
Reference35 articles.
1. A study of emission from the (1,1,1) faces of GaAs negative electron affinity photoemitters
2. Electronic structure of the activating layer in III-V:Cs-O negative-electron-affinity photoemitters
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1. Dark current and sensitivity measurements for structured S20 photocathodes;Journal of Physics D: Applied Physics;2006-09-29
2. Resonance enhancement of the photoemission from semiconductors with negative electron affinity;Journal of Applied Physics;1996-11-15
3. In situ surface study of the activating layer on GaAs (Cs, O) photocathodes;Journal of Physics D: Applied Physics;1986-07-14
4. Chapter 3 NEA Semiconductor Photoemitters;Semiconductors and Semimetals;1981
5. 26. Exploring the limits of performance of third generation image intensifiers;Vacuum;1980-01
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