Formation of crystallineγ-Al2O3induced by variable substrate biasing during reactive magnetron sputtering-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Formation of crystallineγ-Al2O3induced by variable substrate biasing during reactive magnetron sputtering

Published:2013-02-01 Issue:8 Volume:46 Page:084004
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Prenzel M,Kortmann A,von Keudell A,Nahif F,Schneider J M,Shihab M,Brinkmann R P

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/46/i=8/a=084004/pdf

Reference30 articles.

1. Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering

2. Average energy deposited per atom: A universal parameter for describing ion‐assisted film growth?

3. A novel pulsed magnetron sputter technique utilizing very high target power densities

4. Phase control of Al2O3 thin films grown at low temperatures

5. Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The effect of the electron κ-distribution on the dust particle charging in the radio-frequency thermal-sheaths;Physica Scripta;2024-07-22

2. Fabrication of a wider bandgap θ-Al₂O₃ by oxidation of ultrathin AlN films for leakage current reduction;Japanese Journal of Applied Physics;2024-02-16

3. The impact of plasma enhancement on the deposition of carbon‐containing zirconia films by metalorganic chemical vapor deposition;Plasma Processes and Polymers;2023-06-15

4. Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge;Plasma Science and Technology;2022-01-17

5. Tribological properties of hydrogenated boron carbide (BxC:Hy) thin films on stainless steel deposited by RF-PECVD technique;The European Physical Journal Applied Physics;2020-08

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3