A study on Si nanocrystal formation in Si-implanted SiO2films by x-ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

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A study on Si nanocrystal formation in Si-implanted SiO2films by x-ray photoelectron spectroscopy

Published:2003-09-18 Issue:19 Volume:36 Page:L97-L100
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Liu Y,Chen T P,Fu Y Q,Tse M S,Hsieh J H,Ho P F,Liu Y C

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/36/i=19/a=L02/pdf

Reference15 articles.

1. Light emitting diode structure based on Si nanocrystals formed by implantation into thermal oxide

2. A silicon nanocrystals based memory

3. Effects of traps on charge storage characteristics in metal-oxide-semiconductor memory structures based on silicon nanocrystals

4. Localized charge injection in SiO2 films containing silicon nanocrystals

5. Reversible charging effects in SiO2 films containing Si nanocrystals

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