Author:
Maria Serneiro da Dunkha ,A. Vincent
Abstract
The optical properties of 30-layer [nc-Si:SiO2/ SiO2]30 periodic films have been studied. The films were prepared by alternately evaporating SiO and SiO2 onto Si(100) substrates, followed by annealing at 1100 ◦C. Spectroscopic ellipsometry spectrum analysis was used to deter- mine the optical constants of the samples via the Forouhi–Bloomer model. The optical bandgap of a single periodic film is calculated. The photoluminescence (PL) spectra of three samples with different thicknesses clearly show that there are two physical origins of the PL process.
Publisher
Iraqi Forum for Intellectuals and Academics