Sources for beyond extreme ultraviolet lithography and water window imaging-Reference-Cited by-同舟云学术

Sources for beyond extreme ultraviolet lithography and water window imaging

Published:2015-04-30 Issue:5 Volume:90 Page:054002
ISSN:0031-8949
Container-title:Physica Scripta
language:
Short-container-title:Phys. Scr.

Author:

O’Sullivan Gerry,Li Bowen,Dunne Padraig,Hayden Paddy,Kilbane Deirdre,Lokasani Ragava,Long Elaine,Ohashi Hayato,O’Reilly Fergal,Sheil John,Sheridan Paul,Sokell Emma,Suzuki Chihiro,White Elgiva,Higashiguchi Takeshi

Funder

Science Foundation Ireland

Publisher

IOP Publishing

Subject

Condensed Matter Physics,Mathematical Physics,Atomic and Molecular Physics, and Optics

Link

http://stacks.iop.org/1402-4896/90/i=5/a=054002/pdf

Reference45 articles.

1. Soft X-Rays and Extreme Ultraviolet Radiation

2. Analyses of the Sn IX–Sn XII spectra in the EUV region

3. Analysis of the spectra of In XII–XIV and Sn XIII–XV in the far-VUV region

4. X‐ray emission in laser‐produced plasmas

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