Plasma process monitoring of BCl3using high-resolution infrared laser absorption spectroscopy
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Reference35 articles.
1. Plasma-assisted boriding of industrial components in a pulsed d.c. glow discharge
2. Plasma etching of III–V semiconductors in BCl3 chemistries: Part I: GaAs and related compounds
3. A study on plasma-assisted bonding of steels
4. Plasmaborieren - Untersuchungen zum Einfluß der Glimmentladung beim Borieren in einer BCl3-H2-Ar-Atmosphäre
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