Line image sensors for spectroscopic applications in the extreme ultraviolet
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Reference26 articles.
1. Charge Coupled Semiconductor Devices
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1. Extreme ultraviolet lithography resist-based aberration metrology;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-10-02
2. Characterization of Backside-Illuminated CMOS APS Prototypes for the Extreme Ultraviolet Imager On-Board Solar Orbiter;IEEE Transactions on Electron Devices;2013-05
3. EUV reflectometry for thickness and density determination of thin film coatings;Applied Physics A;2012-04-17
4. Quantum Efficiency Determination of a Novel CMOS Design for Fast Imaging Applications in the Extreme Ultraviolet;IEEE Transactions on Electron Devices;2012-03
5. Spectral Sharpening Algorithm for a Polychromatic Reflectometer in the Extreme Ultraviolet;Applied Spectroscopy;2010-04
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