Nanometric lateral scale development with Si/SiO2multilayer thin-film structures and improvement of uncertainty evaluation using analysis of variance
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Reference19 articles.
1. Sub-hundred nanometre pitch measurements using an AFM with differential laser interferometers for designing usable lateral scales
2. Nanometric lateral scale development using an atomic force microscope with directly traceable laser interferometers
3. Round-robin measurements of 100- and 60-nm scales among a deep-ultraviolet laser diffractometer, a scanning electron microscope and various atomic force microscopes
4. Application of a GaAs/InGaP superlattice in nanometric lateral scales
5. Comparison and uncertainties of standards for critical dimension atomic force microscope tip width calibration
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