Wireless wafer-type probe system for measurement of two-dimensional plasma parameters and spatial uniformity
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Link
http://stacks.iop.org/0957-0233/24/i=9/a=095102/pdf
Reference15 articles.
1. Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas
2. Floating probe for electron temperature and ion density measurement applicable to processing plasmas
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1. Development of Wafer-Type Plasma Monitoring Sensor with Automated Robot Arm Transfer Capability for Two-Dimensional In Situ Processing Plasma Diagnosis;Sensors;2024-03-10
2. Foundations of measurement of electrons, ions and species fluxes toward surfaces in low-temperature plasmas;Plasma Sources Science and Technology;2021-03-01
3. Temporal evolution of two-dimensional electron temperature and ion flux on a substrate in a pulsed-power inductively coupled plasma;Physics of Plasmas;2017-05
4. Time-resolved spatial distribution measurements of pulse-modulated argon plasmas in an inductively coupled plasma reactor;Plasma Sources Science and Technology;2017-04-05
5. Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma;Physics of Plasmas;2015-07
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