Time-resolved spatial distribution measurements of pulse-modulated argon plasmas in an inductively coupled plasma reactor
Author:
Funder
Industrial Strategic Technology Development Program
MOTIE and KSRC
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/26/i=5/a=055016/pdf
Reference36 articles.
1. Highly Selective and Highly AnisotropicSiO2Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma
2. Effect of Power Modulation on Radical Concentration and Uniformity in a Single-Wafer Plasma Reactor
3. Charge‐free etching process using positive and negative ions in pulse‐time modulated electron cyclotron resonance plasma with low‐frequency bias
4. Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching
5. Mechanism of Charging Reduction in Pulsed Plasma Etching
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