Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/1674-1056/23/11/115202/pdf
Reference30 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Ion bombardment energy distributions in a radio frequency induction plasma
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4. Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis
5. Hysteresis and the E-to-H transition in radiofrequency inductive discharges
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