Material dependent modeling of secondary electron emission coefficients and its effects on PIC/MCC simulation results of capacitive RF plasmas
Author:
Funder
Division of Physics
Deutsche Forschungsgemeinschaft
Hungarian National Research, Development and Innovation Office
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/1361-6595/ab094f/pdf
Reference85 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Plasma Electronics
3. Physics of Radio-Frequency Plasmas
4. Electron kinetics at the plasma interface
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