A novel technique for in-situ simultaneous measurement of thickness of deposited film and electron density with two curling probes
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Published:2020-08-11
Issue:7
Volume:29
Page:075009
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ISSN:1361-6595
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Container-title:Plasma Sources Science and Technology
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language:
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Short-container-title:Plasma Sources Sci. Technol.
Author:
Ogawa DaisukeORCID,
Nakamura Keiji,
Sugai Hideo
Subject
Condensed Matter Physics
Cited by
8 articles.
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