Generation of positively and negatively charged molecular ions during sputtering of a copper target by low-energy Ar+ ion bombardment in a dilute argon/oxygen gas mixture-Reference-Cited by-同舟云学术

Generation of positively and negatively charged molecular ions during sputtering of a copper target by low-energy Ar+ ion bombardment in a dilute argon/oxygen gas mixture

Published:2019-03-12 Issue:3 Volume:28 Page:035008
ISSN:1361-6595
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Hippler Rainer^ORCID,Denker Christian

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://iopscience.iop.org/article/10.1088/1361-6595/ab0706/pdf

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