Parametric study of low-pressure electron beam generated Ar–SF6plasma and implications for processing
Author:
Funder
Naval Research Laboratory 6.1 Base Program
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/1361-6595/aa85f1/pdf
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1. Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features
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