Excitation of Ar, O2, and SF6/O2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron excitation mode-Reference-Cited by-同舟云学术

Excitation of Ar, O2, and SF6/O2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron excitation mode

Published:2018-07-13 Issue:7 Volume:27 Page:074003
ISSN:1361-6595
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Fischer G^ORCID,Ouaras K,Drahi E^ORCID,Bruneau B,Johnson E V

Funder

Agence Nationale de la Recherche

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://iopscience.iop.org/article/10.1088/1361-6595/aaca05/pdf

Reference32 articles.

1. Physics of Radio-Frequency Plasmas

2. The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux

3. Strong Ionization Asymmetry in a Geometrically Symmetric Radio Frequency Capacitively Coupled Plasma Induced by Sawtooth Voltage Waveforms

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