Time-resolved study of the electron temperature and number density of argon metastable atoms in argon-based dielectric barrier discharges
Author:
Funder
Natural Sciences and Engineering Research Council of Canada
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/1361-6595/aaa5d9/pdf
Reference41 articles.
1. Characterization of argon dielectric barrier discharges applied to ethyl lactate plasma polymerization
2. Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Deposited at Low Temperatures
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4. Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition
5. Feasibility of Antireflection and Passivation Coatings by Atmospheric Pressure PECVD
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