Sputtering process during ion implantation in glasses: mathematical and physical analysis
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering,Condensed Matter Physics
Link
http://stacks.iop.org/0022-3719/16/i=1/a=024/pdf
Reference12 articles.
1. Spatial distribution of energy deposited into atomic processes in ion-implanted silicon
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