Fast-sweeping Langmuir probes: what happens to the I-V trace when sweeping frequency is higher than the ion plasma frequency?

Abstract

Abstract Limited particle transit time is one of several limiting factors which determines the maximum temporal resolution of a Langmuir probe. In this work, we have revisited known fast sweep Langmuir probe techniques in a uniform, quiescent multi-dipole confined hot cathode discharge with two operation scenarios: one in which the probe sweeping frequency fsweep is much lower than the ion plasma frequency fpi, another one where fsweep is much greater than fpi, respectively. This allows the investigation of the effect of limited ion-motion on I-V traces. Serious distortions of I-V traces at high frequencies, previously claimed to be ion-motion limitation effect, was not found in the degree previously claimed unless shunt resistance is sufficiently high, despite achieving a ratio of ~ 3 between the probe sweeping frequency and the ion plasma frequency. On the other hand, evidences of sheath capacitance on the I-V trace have been observed. Distortions of I-V traces qualitatively agrees with predictions of sheath capacitance response to the sweeping voltage. Additionally, techniques in fast sweep Langmuir probe are briefly discussed. The comparison between a High-speed dual Langmuir probe (HDLP) and the single probe setup shows that the capacitive response can be removed via subtracting a leakage current for the single probe setup almost as effective as using an HDLP setup, but the HDLP setup does remain advantageous in its facilitation of better recovery of weak current signal common in low plasma density situations.