Effect of gas components on the post-discharge temporal behavior of OH and O of a non-equilibrium atmospheric pressure plasma driven by nanosecond voltage pulses

Author:

WANG 王 Lanping 兰萍,NIE 聂 Lanlan 兰兰,LU 卢 Xinpei 新培

Abstract

Abstract OH radicals and O atoms are two of the most important reactive species of non-equilibrium atmospheric pressure plasma (NAPP), which plays an important role in applications such as plasma medicine. However, experimental studies on how the gas content affects the post-discharge temporal evolutions of OH and O in the noble gas ns-NAPP are very limited. In this work, the effect of the percentages of O2, N2, and H2O on the amounts of OH and O productions and their post-discharge temporal behaviors in ns-NAPP is investigated by laser-induced fluorescence (LIF) method. The results show that the productions of OH and O increase and then decrease with the increase of O2 percentage. Both OH and O densities reach their maximum when about 0.8% O2 is added. Further increase of the O2 concentration results in a decrease of the initial densities of both OH and O, and leads to their faster decay. The increase of N2 percentage also results in the increase and then decrease of the OH and O densities, but the change is smaller. Furthermore, when the H2O concentration is increased from 100 to 3000 ppm, the initial OH density increases slightly, but the OH density decays much faster, while the initial density of O decreases with the increase of the H2O concentration. After analysis, it is found that OH and O are mainly produced through electron collisional dissociation. O(1D) is critical for OH generation. O3 accelerates the consumption processes of OH and O at high O2 percentage. The addition of H2O in the NAPP considerably enhances the electronegativity, while it decreases the overall plasma reactivity, accelerates the decay of OH, and reduces the O atom density.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

IOP Publishing

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