Investigation on machinability of the oxide layer in anodic oxidation of reaction-sintered silicon carbide by pure-water

Abstract

Abstract Oxidation-assisted polishing has been developed as an efficient method for precision machining of reaction-sintered silicon carbide (RS-SiC), and characteristic of the oxide layer is the critical factor to obtain a fine surface property. Machinability of the oxide layer obtained in anodic oxidation of RS-SiC by the pure-water under high-frequency-square-wave potential is investigated by the ceria slurry polishing in this study. Quantitative analysis of surface quality of the oxidized RS-SiC sample is conducted by the scanning white light interferometer (SWLI) measurement. Along with increase of the oxidation time, surface quality of the oxidized RS-SiC is changing better at the beginning, and rapidly deteriorated in further oxidation process. Surface qualities of the RS-SiC sample before oxidation, after oxidation, after HF etching, and after abrasive polishing, are compared by the SWLI measurement. Surface roughness rms after anodic oxidation for 60min is 189.004nm. After removing the oxide by ceria slurry polishing, the rms can reach 3.688nm. Meanwhile, there is no visible scratch on the new revealed surface. Therefore, combination of anodic oxidation of RS-SiC by pure water and abrasive polishing of oxide layer by ceria slurry can be considered as an efficient method to machine RS-SiC.