In situmeasurement of VUV/UV radiation from low-pressure microwave-produced plasma in Ar/O2gas mixtures-Reference-Cited by-同舟云学术

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In situmeasurement of VUV/UV radiation from low-pressure microwave-produced plasma in Ar/O2gas mixtures

Published:2017-07-17 Issue:8 Volume:28 Page:085501
ISSN:0957-0233
Container-title:Measurement Science and Technology
language:
Short-container-title:Meas. Sci. Technol.

Author:

Iglesias E J,Mitschker F,Fiebrandt M,Bibinov N,Awakowicz P

Funder

Deutsche Forschungsgemeinschaft

Publisher

IOP Publishing

Subject

Applied Mathematics,Instrumentation,Engineering (miscellaneous)

Link

http://stacks.iop.org/0957-0233/28/i=8/a=085501/pdf

Reference38 articles.

1. A H2very high frequency capacitively coupled plasma inactivates glyceraldehyde 3-phosphate dehydrogenase(GapDH) more efficiently than UV photons and heat combined

2. Characterization of low-pressure microwave and radio frequency discharges in oxygen applying optical emission spectroscopy and multipole resonance probe

3. Material challenge for flexible organic devices

4. Cold Atmospheric Pressure Plasma VUV Interactions With Surfaces: Effect of Local Gas Environment and Source Design

5. Living tissue under treatment of cold plasma atmospheric jet

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