Effect of hydrogen on low temperature epitaxial growth of polycrystalline silicon by hot wire chemical vapor deposition-Reference-Cited by-同舟云学术

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Effect of hydrogen on low temperature epitaxial growth of polycrystalline silicon by hot wire chemical vapor deposition

Published:2015-02 Issue:2 Volume:36 Page:023004
ISSN:1674-4926
Container-title:Journal of Semiconductors
language:
Short-container-title:J. Semicond.

Author:

Cao Yong,Zhang Hailong,Liu Fengzhen,Zhu Meifang,Dong Gangqiang

Publisher

IOP Publishing

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/1674-4926/36/i=2/a=023004/pdf

Reference24 articles.

1. Reversible conductivity changes in discharge‐produced amorphous Si

2. Polycrystalline silicon thin-film solar cells: Status and perspectives

3. Polycrystalline silicon thin-film solar cells on glass

4. Progress with polycrystalline silicon thin-film solar cells on glass at UNSW

5. A new era of crystallization: advances in polysilicon crystallization and crystal engineering

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Petrogenesis of lherzolites from the Purang ophiolite, Yarlung-Zangbo suture zone, Tibet: origin and significance of ultra-high pressure and other ‘unusual’ minerals in the Neo-Tethyan lithospheric mantle;International Geology Review;2019-03-04

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