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The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching

  • Published:2009-01-14 Issue:6 Volume:20 Page:065307
  • ISSN:0957-4484
  • Container-title:Nanotechnology
  • language:
  • Short-container-title:Nanotechnology

Author:

Chekurov N,Grigoras K,Peltonen A,Franssila S,Tittonen I

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

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