Thermal conductivity of amorphous Al2O3/TiO2nanolaminates deposited by atomic layer deposition-Reference-Cited by-同舟云学术

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Thermal conductivity of amorphous Al2O3/TiO2nanolaminates deposited by atomic layer deposition

Published:2016-09-27 Issue:44 Volume:27 Page:445704
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Ali Saima,Juntunen Taneli,Sintonen Sakari,Ylivaara Oili M E,Puurunen Riikka L,Lipsanen Harri,Tittonen Ilkka,Hannula Simo-Pekka

Funder

Directorate-General for Communications Networks, Content and Technology

Tekes

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/27/i=44/a=445704/pdf

Reference49 articles.

1. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

2. Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

3. Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

4. A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy

5. Al2O3/TiO2 stack layers for effective surface passivation of crystalline silicon

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