Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence-Reference-Cited by-同舟云学术

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Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

Published:2009-02-24 Issue:11 Volume:20 Page:115303
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Zuppella P,Luciani D,Tucceri P,De Marco P,Gaudieri A,Kaiser J,Ottaviano L,Santucci S,Reale A

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/20/i=11/a=115303/pdf

Reference14 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Imprint Lithography with 25-Nanometer Resolution

3. Deposition of Organic Material by the Tip of a Scanning Force Microscope

4. Introduction to the focused ion beam system

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