Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering
Link
http://stacks.iop.org/0957-4484/14/i=1/a=320/pdf
Reference11 articles.
1. Excitation of elastic surface waves by spatial harmonics of interdigital transducers
2. Generating ∼90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask
3. Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field
4. Imprint of sub‐25 nm vias and trenches in polymers
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