An efficient method to improve the proximity effect for electron beam optical disc mastering
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering
Link
http://stacks.iop.org/0957-4484/16/i=4/a=013/pdf
Reference14 articles.
1. Nanostructure fabrication using electron beam and its application to nanometer devices
2. Reduction and elimination of proximity effects
3. An efficient proximity-effect correction method for electron-beam patterning of photonic-crystal devices
4. Determination of proximity effect parameters and the shape bias parameter in electron beam lithography
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Fabrication of Nanopit Array Using Electron Beam Lithography;Advanced Materials Research;2011-10
2. Laser precision engineering: from microfabrication to nanoprocessing;Laser & Photonics Reviews;2010-01-04
3. Reduction of proximity effect in electron beam lithography by deposition of a thin film of silicon dioxide;Korean Journal of Chemical Engineering;2008-03
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