Reduction of proximity effect in electron beam lithography by deposition of a thin film of silicon dioxide-Reference-Cited by-同舟云学术

Reduction of proximity effect in electron beam lithography by deposition of a thin film of silicon dioxide

Published:2008-03 Issue:2 Volume:25 Page:373-376
ISSN:0256-1115
Container-title:Korean Journal of Chemical Engineering
language:en
Short-container-title:Korean J. Chem. Eng.

Author:

Seo Chang-Ho,Suh Kahp-Yang

Publisher

Springer Science and Business Media LLC

Subject

General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s11814-008-0062-x.pdf

Reference16 articles.

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2. W. M. Moreau, Semiconductor lithography: principles, practices, and materials, microdevices, Plenum Press, New York, (1988).

3. L. F. Thompson, C. G. Willson and M. J. Bowden, Introduction to microlithography, 2nd ed, ACS professional reference book, American Chemical Society, Washington, DC (1994).

4. C. Stebler, M. Despont, U. Staufer, T. H. P. Chang, K. Y. Lee and S. A. Rishton, Microelectronic Engineering, 30, 45 (1996).

5. E. Seo, B. K. Choi and O. Kim, Microelectronic Engineering, 53, 305 (2000).

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