Interdigitated 50 nm Ti electrode arrays fabricated using XeF2enhanced focused ion beam etching-Reference-Cited by-同舟云学术

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Interdigitated 50 nm Ti electrode arrays fabricated using XeF2enhanced focused ion beam etching

Published:2006-05-16 Issue:11 Volume:17 Page:2722-2729
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Santschi Ch,Jenke M,Hoffmann P,Brugger J

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/17/i=11/a=002/pdf

Reference37 articles.

1. Ion-beam sculpting at nanometre length scales

2. Nanoelectrodes, nanoelectrode arrays and their applications

3. The fabrication and electrochemical characterization of carbon nanotube nanoelectrode arrays

4. Carbon Nanotube Nanoelectrode Array for Ultrasensitive DNA Detection

5. Indium channel implants for improved MOSFET behavior at the 100-nm channel length regime

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