Silicide induced ion beam patterning of Si(001)-Reference-Cited by-同舟云学术

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Silicide induced ion beam patterning of Si(001)

Published:2014-02-24 Issue:11 Volume:25 Page:115303
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Engler Martin,Frost Frank,Müller Sven,Macko Sven,Will Moritz,Feder René,Spemann Daniel,Hübner René,Facsko Stefan,Michely Thomas

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/25/i=11/a=115303/pdf

Reference74 articles.

1. Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering

2. Step Edge Diffusion and Step Atom Detachment in Surface Evolution: Ion Erosion of Pt(111)

3. Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws

4. Topography evolution mechanism on fused silica during low-energy ion beam sputtering

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1. Low-energy ion beam erosion of Si with simultaneous co-deposition of metallic surfactants: Experimental and simulated data;Applied Surface Science;2024-02

2. Carbon ion beam induced chemical modification and nano-pyramid growth on Si surface;Physica Scripta;2022-12-29

3. Effects of metal redeposition in plasma sputtering;Journal of Vacuum Science & Technology A;2022-12

4. Study of the topography of silicon surface evolution under irradiation by a gallium ion beam;Vacuum;2022-09

5. Surface nanopatterning by ion beam irradiation: compositional effects;Journal of Physics: Condensed Matter;2022-06-20

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