Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing-Reference-Cited by-同舟云学术

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Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing

Published:2016-09-08 Issue:41 Volume:27 Page:415601
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Xiong Shisheng,Chapuis Yves-Andre,Wan Lei,Gao He,Li Xiao,Ruiz Ricardo,Nealey Paul F

Funder

Advanced Storage Technology Consortium

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/27/i=41/a=415601/pdf

Reference23 articles.

1. Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance

2. Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

3. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures

4. High-Density Bit Patterned Media: Magnetic Design and Recording Performance

5. Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media

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1. Spatially Amplified and Rigid Junction in Diblock Copolymers: Reduced Microphase Separation Size via Interface Expansion;ACS Macro Letters;2024-03-06

2. Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives;Nanotechnology;2023-03-06

3. Engineering the domain roughness of block copolymer in directed self-assembly;Polymer;2022-05

4. Fabrication of Nanodevices Through Block Copolymer Self-Assembly;Frontiers in Nanotechnology;2022-02-10

5. 亚十纳米导向自组装与深紫外混合光刻技术;Laser & Optoelectronics Progress;2022

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