Influence of thermal annealing on the morphology and magnetic domain structure of Co thin films

Abstract

Abstract Centimeter scale cobalt films with various thicknesses (8 nm ∼ 100 nm) were deposited by electron beam evaporation (EBE) and then annealed in a gas mixture of Ar and H2 at temperatures ranging from 200 °C to 500 °C. Advanced characterization techniques (e.g., XRD, SEM, AFM and MFM) were employed to investigate the influence of annealing on the morphology, crystal structures and magnetic domain structures of Co thin films. The results of SEM and AFM suggest that there is no obvious change in the morphology of Co film before and after annealing especially for thicker films and the root-mean-square roughness of Co film surface is slightly reduced after annealing. The influence of thermal annealing on the magnetic domain structure of EBE Co thin films was investigated by magnetic force microscopy (MFM) for the first time. It is found that even if there is no clear domain structure in the as-deposited films, it is possible to obtain periodic stripe domains with perpendicular magnetic anisotropy (PMA) by thermal annealing owing to the development of HCP Co phase, which was confirmed by XRD analysis. The correlations between the film morphology, thickness and magnetic domain structure are discussed qualitatively. Based on the periodic stripe magnetic domains, the domain-wall energy density of annealed cobalt films is calculated and this study found that the annealing has almost no effect on the energy density of the domain-wall. This work provides an effective way to obtain the perpendicular magnetic anisotropy (PMA) for practical applications.