Multi-layer lithography using focal plane changing for SU-8 microstructures

Abstract

Abstract In this paper, we report on a type of SU-8 microstructure with vertical sidewalls used for polydimethydiloxane (PDMS) microchannels. Multi-layer lithography using focal plane changing approach is proposed to expose the SU-8 photoresist based on a digital micromirror device (DMD) maskless lithography system. We used a light-emitting diode source with a wavelength of 405 nm. The thickness of the SU-8 is divided into multi-layers according to the depth of focus. Each layer corresponds to a depth of focus, and then, a virtual mask is designed for the layer. Finally, each layer is exposed to changes in the focal plane. The results indicate that the actual profile of the SU-8 mold shows good agreement with the design profile without any T-profiles. Additionally, there is better linewidth in the proposed method compared with multi-exposure by a single fixed focal plane. The PDMS microchannels result also demonstrate the stability of the SU-8 mold.