Plasma-prepared arsenic telluride films: relationship between physico-chemical properties on the parameters of the deposition process
Author:
Funder
Russian Science Foundation
Publisher
IOP Publishing
Subject
Metals and Alloys,Polymers and Plastics,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1088/2053-1591/ab62ea/pdf
Reference37 articles.
1. Investigation of the composition-structure-property relationship of AsxTe100x films prepared by plasma deposition
2. Synthesis and properties of AsxTe100−x films prepared by plasma deposition via elemental As and Te
3. Influence of Plasma-Enhanced Chemical Vapor Deposition Parameters on Characteristics of As–Te Chalcogenide Films
4. A new method for synthesis of As-Te chalcogenide films
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