Microstructure evolution and hard x-ray reflectance of ultrathin Ru/C multilayer mirrors with different layer thicknesses

Abstract

Abstract Nanoscale Ru/C multilayers are essential reflective optics in the hard x-ray region of 7–20 keV. To understand the layer growth behavior and develop ultrathin Ru/C multilayer mirrors with periods smaller than 3.0 nm, multilayers with different periods of 6.2–1.5 nm were fabricated and studied. It is found that the average interface width started to increase obviously when the period became smaller than 2.5 nm while the surface roughness of different multilayers remained almost the same. The intrinsic stress of the multilayer gradually decreased with decreasing period and reached a very low value of −82 MPa at d = 2.3 nm. High reflectance of 54% and 65% (at E = 8.04 keV) were demonstrated for the multilayers with periods of 2.5 nm and 3.0 nm, respectively, whereas that for 1.9 nm period was significantly lower. To further analyze the layer microstructure, x-ray diffraction and transmission electron microscopy were used. The polycrystallized structure of Ru remained similar for the multilayers with period less than 2.5 nm, while a non-continuous layer growth and severe intermixing between Ru and C were observed for the multilayer with period of 1.9 nm. The increased intermixing between Ru and C was found to be the main reason for the larger interface width and lower reflectance of the multilayers with period smaller than 2.5 nm. It also indicated that the layer thickness threshold for a Ru/C multilayer growing with good layer quality is 1.0–1.2 nm.