Sputtering of redeposited material in focused ion beam silicon processing
Author:
Publisher
IOP Publishing
Subject
Metals and Alloys,Polymers and Plastics,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials
Link
http://iopscience.iop.org/article/10.1088/2053-1591/aaace1/pdf
Reference46 articles.
1. Comparison of technologies for nano device prototyping with a special focus on ion beams: A review
2. Direct-Write Ion Beam Lithography
3. Influence of the Redeposition effect for Focused Ion Beam 3D Micromachining in Silicon
4. Influence of FIB patterning strategies on the shape of 3D structures: Comparison of experiments with simulations
5. Prediction of surface topography due to finite pixel spacing in FIB milling of rectangular boxes and trenches
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