Atomic layer deposition of TiO2 and Al2O3 thin films for the electrochemical study of corrosion protection in aluminum alloy cans used in beverage

Abstract

Abstract Titanium dioxide (TiO2) and aluminum oxide (Al2O3) thin films, with thicknesses around 100 nm, were grown on commercial pure- and resin-coated Al substrates using the atomic layer deposition (ALD). A comprehensive and comparative study of corrosion protection was carried out by linear sweep voltammetry (LSV) and electrochemical impedance spectroscopy (EIS) measurements for a set of six samples: two reference samples (Al-bare and Al-resin), and four ALD coated samples ( Al-TiO2, Al-Al2O3, Al-resin-TiO2, and Al-resin-Al2O3). The LSV and EIS results display good mutual agreement, indicating a higher protection efficiency of all ALD-coated samples after immersion in NaCl. When compared to Al-bare, all ALD coated samples (TiO2 or Al2O3) showed a corrosion inhibition enhancement factor of 99%. Besides, our results demonstrated that Al-resin+Al2O3 has 24.95% and 33.40% more corrosion inhibition than Al-Al2O3 and Al-resin, respectively. EIS data were fitted by an equivalent electric circuit (EEC). The Nyquist and Bode plots from the experiments showed that ALD films are a potential candidate for altering/improving commercial resin-coated Al cans.