Optical properties of HfOx (x < 2) films grown by ion beam sputtering-deposition method
Author:
Publisher
IOP Publishing
Subject
Metals and Alloys,Polymers and Plastics,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials
Link
http://iopscience.iop.org/article/10.1088/2053-1591/aae594/pdf
Reference21 articles.
1. Observation of bulk HfO2 defects by spectroscopic ellipsometry
2. Spectroscopic ellipsometry characterization of high-k dielectric HfO2 thin films and the high-temperature annealing effects on their optical properties
3. Sub-bandgap defect states in polycrystalline hafnium oxide and their suppression by admixture of silicon
4. Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering
5. Memristive switching mechanism for metal/oxide/metal nanodevices
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1. Water Dose influence to the ALD hafnium oxide process: Simulation and experiment;Materials Today Communications;2024-06
2. Molecular Dynamics for Microscopic Analysis of Refractive Index in Amorphous Hafnium Oxides;Frontiers in Optics + Laser Science 2022 (FIO, LS);2022
3. Properties of Hafnium and Aluminium Silicates Coatings Obtained by PLD;Coatings;2021-06-23
4. Comparative study of electron-beam crystallization of amorphous hafnium oxides HfO2 and HfOx (x = 1.82);SN Applied Sciences;2020-06-23
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