Recent understanding of the growth process of amorphous silicon from a silane glow-discharge plasma
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Nuclear Energy and Engineering
Link
http://stacks.iop.org/0741-3335/39/i=5A/a=040/pdf
Reference8 articles.
1. Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon
2. Laser diagnostics of a silane plasma—SiH radicals in an a‐Si:H chemical vapor deposition system
3. Spatial Distribution of SiH3Radicals in RF Silane Plasma
4. Real timeinsituobservation of the film growth of hydrogenated amorphous silicon by infrared reflection absorption spectroscopy
5. Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon
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