An unconventional ion implantation method for producing Au and Si nanostructures using intense laser-generated plasmas
Author:
Funder
Laserlab-Europe
CANAM
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Nuclear Energy and Engineering
Link
http://stacks.iop.org/0741-3335/58/i=2/a=025011/pdf
Reference43 articles.
1. Effect of different preparation conditions on light emission from silicon implanted SiO2 layers
2. Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
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5. Laser-plasma acceleration of quasi-monoenergetic protons from microstructured targets
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