Preparation and characterization of heavily doped μc-Si:F:H films by windowless photo-CVD
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/0256-307X/6/12/010/pdf
Reference7 articles.
1. Direct photochemical deposition of SiO2from the Si2H6+O2system
2. Morphology of hydrogenated amorphous silicon films by photochemical vapor deposition
3. Laser photodeposition of metal films with microscopic features
4. Analysis of Deposition Rate Distribution in the Photo-CVD of a-Si by a Unified Reactor with a Lamp
5. SiO2Thin Film Prepared from Si3H8and O2by Photo-CVD Using Double Excitation
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